中国农业大学理学院学术报告 Dielectric thin films (Low-k and High-k) deposition and characterizations towards semiconductor device applications

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理学院研究生学术交流系列报告： Dielectric thin films (Low-k and High-k) deposition and characterizations towards semiconductor device applications
报告人：Dr. Ashok Mahadu Mahajan ；North Maharashtra University, INDIA 时间：2018年10月14日（星期日）上午9:00 地点：理学院302 主办单位：应用物理系联系人：何志巍，王学进联系方式：6273 6711，6273 7303
Dr. Ashok Mahadu Mahajan研究工作及报告简介 1) under this title the report will cover the types of dielectric films their applications, their various techniques of deposition ( like sol-gel, PECVD, RF sputtering, ALD etc. 2) Details of their characterization ( surface and structural characterizations ( using AFM, XPS, FTIR, SEM etc.).
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